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Radiant Energy > Irradiation Of Objects Or Material Irradiation Of Objects Or MaterialIrradiation Of Objects Or Material patent applications listed are from June 2005 to current and include Date, Patent Application Number, Patent Title, Patent Abstract summary and are linked to the corresponding patent application page.01/31/08 - 20080023651 - Tdi detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which ... 01/17/08 - 20080011966 - Direct production of thermal antineutrons and antiprotons A method for obtaining free thermal antineutrons within the cage-like structure of a fullerene molecule comprising irradiating the fullerene molecule with free neutrons causing free neutrons to be trapped within the fullerene molecule wherein the trapped neutron oscillates between the neutron and antineutron states. A method for producing antiprotons comprising ... 01/03/08 - 20080001100 - Apparatus for inspecting a substrate having a ring illumination unit An apparatus for inspecting a substrate includes a stage configured to support a substrate having an inspection region and an image acquisition unit configured to acquire an image of the inspection region to inspect the inspection region. A ring illumination unit is between the stage and the image acquisition unit ... 12/13/07 - 20070284545 - Method and system for radiotherapy treatment A method for radiotherapy treatment of a target organ in the vicinity of the rectum in an individual comprises withdrawing the rectum in a dorsal direction to increase a distance between the rectum and the target organ, and administering a therapeutical dose of radiation to the target organ while the ... 12/13/07 - 20070284544 - Method of manipulating nanosize objects and utilization thereof Light resonant with an electronic excitation level of nanosize objects is projected onto a plurality of closely located nanosize objects, such as quantum dots, quantum dot pairs, and a carbon nanotube, in a collection of nanosize objects is disclosed. In so doing, to control the mechanical interaction induced between the ... 11/29/07 - 20070272878 - Balancing means for high-speed scanning Translational motion of a scanning head relative to a planar target, or vice versa, is achieved by a belt and pulley system with a counterweight that is also driven by a belt and pulley system at the same speed but in the opposite direction as the scanning head. The components ... 11/15/07 - 20070262268 - Method for imaging a pattern onto a target portion of a substrate A method for imaging a pattern onto a target portion of a substrate, comprises: providing a projection system configured to project a patterned radiation beam onto a target portion of a substrate,providing a substrate positioned on a substrate table, providing a level sensor arranged to provide level sensor readings being ... 11/08/07 - 20070257205 - Apparatus and method for treating a substrate with uv radiation using primary and secondary reflectors Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support ... 11/01/07 - 20070252092 - Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor Certain film deposition and selective etching technology may involve scanning of a charged particle beam along with a deposition gas and etching gas, respectively. In conventional methods, unfortunately, the deposition rate or the selective ratio is oftentimes decreased depending on optical system setting, scan spacing, dwell time, loop time, substrate, ... 10/11/07 - 20070235663 - Insulator system for a terminal structure of an ion implantation system An ion implantation system includes an ion source configured to provide an ion beam, a terminal structure defining a cavity, the ion source at least partially disposed within the cavity, and an insulator system. The insulator system is configured to electrically insulate the terminal structure and is configured to provide ... 10/04/07 - 20070228289 - Apparatus and method for exposing a substrate to uv radiation while monitoring deterioration of the uv source and reflectors Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support ... 09/27/07 - 20070221869 - Radiotherapy apparatus The invention described herein solves the problem of keeping the target-to-skin dose ratio high while simplifying the complex structure of the source and the radiation beams; thus, lowering the cost of the radiotherapy device. Taught are radiotherapy devices for treating a patient having a treatment volume comprising a drum with ... 08/09/07 - 20070181827 - Lithographic apparatus, calibration method, device manufacturing method and computer program product Calibration of spot height offsets in a level sensor is performed on a resist-coated substrate to eliminate process dependencies of substrate position measurements obtained by the level sensor. ... 08/02/07 - 20070176121 - Pressure sensor A vacuum-driven gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the vacuum-driven gas gauge proximity sensor uses a vacuum to reverse the traditional flow of gas through a proximity sensor, such that gas flows ... 08/02/07 - 20070176120 - Method for the selective sterilization of diagnostic test elements The invention concerns a method for producing integrated, diagnostic test elements (1) which have a lancing area (2) and a detection area (3). The lancing area is used to generate an opening in the skin and the detection area is used to detect an analyte in a body fluid. The ... 07/12/07 - 20070158587 - Mehtod for generating oscillation data for supporting vitality of living body The present invention aims at realizing mass production of an oscillation data recorded in oscillation data recording water for supporting vitality of living bodies on the industrial basis. Using an oscillation data in-printer, the negative code, the positive code, and the intermediate code are respectively recorded in the oscillation data ... 07/05/07 - 20070152169 - Move mechanism for moving target object and charged particle beam writing apparatus A move mechanism for horizontally moving a target object in an accelerating manner, includes a moving unit configured to be horizontally moved in an accelerating manner, a plate part arranged on the moving unit and supported by the moving unit at a substantially center-of-gravity height position, and a mirror part ... 07/05/07 - 20070152168 - Substrate protecting member and method of forming analysis sample using the same In a substrate protecting member and a method of forming an analysis sample using the same, the substrate protecting member includes a protective layer attached to a semiconductor substrate to protect a defect portion of the semiconductor substrate and a sensing line including first, second and third conductive lines located ... 06/21/07 - 20070138411 - Visible light curing systems, methods for reducing health risks to individuals exposed to systems designed to cure curable compositions by exposure to radiation, methods for bonding substrates and visible light curing compositions The present invention provides visible light curing systems, methods for reducing health risks to individuals exposed to radiation curing systems, methods for bonding substrates and visible light curing compositions. ... 06/14/07 - 20070131876 - Multiple room radiation treatment system The present invention refers to a radiation system (1) comprising an eccentric gantry (100) arranged in connection with multiple treatment rooms (61-68) separated by radiation-shielding separating members (71-78). A movable rotation head (120) is connected to the gantry (100) and is able to move between, and direct a radiation beam ... 06/07/07 - 20070125962 - Observation unit It is an object of the present invention to provide an observation unit which efficiently cools apparatus members in a reaction chamber of a semiconductor manufacturing apparatus in a high-temperature atmosphere and reduces overexposure. An observation unit comprising: an imaging apparatus for imaging the inside of a reaction chamber of ... 06/07/07 - 20070125961 - Micromechanical system A micromechanical system including a micromechanical structure and a shadow mask device. The micromechanical structure and the shadow mask device are produced from a single wafer. The micromechanical structure includes a covering surface to be acted upon in a covering area. The covering surface is produced in the course of ... 05/31/07 - 20070120072 - Illumination system particularly for microlithography There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and ... 05/31/07 - 20070120071 - Electron-beam device and detector system An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With ... 05/24/07 - 20070114451 - Lithographic apparatus and device manufacturing method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap. ... 04/19/07 - 20070085033 - Electron beam column for writing shaped electron beams An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and ... 04/19/07 - 20070085032 - Writing a circuit design pattern with shaped particle beam flashes A shaped particle beam writing strategy can be used to write a pattern with a particle beam onto a substrate. The pattern comprises a circuit design that is fractured into a plurality of arbitrary polygons. The writing strategy comprises transforming and fracturing the arbitrary polygons into a plurality of restricted ... 04/19/07 - 20070085031 - Placement effects correction in raster pattern generator A method for generating a flash. The method includes computing a displacement vector to resist charging. The displacement vector is defined as {right arrow over (δ)}c=dP{circle around (x)}{right arrow over (K)}, where {right arrow over (δ)}crepresents the displacement vector, d represents dose correction multipliers, P represents a pattern and {right ... 04/19/07 - 20070085030 - Critical dimension effects correction in raster pattern generator A method for generating a flash. The method includes computing dose correction multipliers taking into account fogging scattering effects, backscattering effects and fast secondary scattering effects; and using the dose correction multipliers to generate the flash. ... 04/19/07 - 20070085029 - Dc only tool cell with a charged particle beam system Systems, methods, and apparatus for reducing EMI in charged particle beam systems are provided. By placing noise sensitive electronic modules used in charged particles systems in a shielded equipment cell, and routing DC only signals to power the modules, EMI within the housing may be significantly reduced. ... 03/15/07 - 20070057200 - Electron beam apparatus and method of generating an electron beam irradiation pattern High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure of electron beams is performed based on a result of filtering ... 03/08/07 - 20070051904 - Gantry system for particle therapy, therapy plan or radiation method for particle therapy with such a gantry system A gantry system for particle therapy system, therapy plan and radiation method for a particle therapy with such a gantry system is provided. The gantry system for a particle therapy system includes a particle beam. A first beam guiding device rotatable about an axis of rotation of the gantry guides ... 03/01/07 - 20070045567 - Particle beam processing apparatus and materials treatable using the apparatus The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus ... 02/01/07 - 20070023691 - Laser processing apparatus A laser processing apparatus comprising a chuck table, laser beam irradiation means for irradiating a workpiece held on the chuck table with a laser beam, and processing feed means for processing-feeding the chuck table and the laser beam irradiation means relative to each other. The laser beam irradiation means includes ... 02/01/07 - 20070023690 - Method of producing heat-resistant electrically charged fluororesin material and method of producing electret condenser microphone using heat-resistant electrically charged fluororesin material A method of producing a heat-resistant electrically charged fluororesin material is provided. The method comprises the steps of providing a fluorine-containing resin material; irradiating the fluorine-containing resin material with ionizing radiation at a temperature not lower than a crystalline melting point of the fluorine-containing resin material in absence of oxygen, ... 01/25/07 - 20070018117 - Imaging mode for linear accelerators Some embodiments include reception of a first instruction to enter an imaging mode, and, in response to the first instruction, automatic performance of at least one of: reduction of a focal spot size of a radiation beam, movement of a flattening filter out of a path of the radiation beam, ... 01/04/07 - 20070001125 - Surface plasmon enhanced illumination apparatus having non-periodic resonance configurations An apparatus configured to generate surface plasmon enhanced radiation comprises a metal film having first and second surfaces, and one or more resonance configurations formed in the metal film. An exemplary resonance configuration includes an aperture extending between the first and second surfaces of the metal film, and at least ... 12/28/06 - 20060289795 - Vacuum reaction chamber with x-lamp heater Methods and apparatus for electron beam treatment of a substrate are provided. An electron beam apparatus that includes a vacuum chamber, at least one thermocouple assembly in communication with the vacuum chamber; and a heating device in communication with the vacuum chamber and combinations thereof are provided. In one embodiment, ... 12/28/06 - 20060289794 - Immersion lithography with equalized pressure on at least projection optics component and wafer An immersion lithography apparatus and method, and a lithographic optical column structure are disclosed for conducting immersion lithography with at least the projection optics of the optical system and the wafer in different fluids at the same pressure. In particular, an immersion lithography apparatus is provided in which a supercritical ... 12/21/06 - 20060284113 - Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same R2s=R2t cos2i2 ... 12/21/06 - 20060284112 - Apparatus and method for specimen fabrication A specimen fabricating apparatus comprises: a specimen stage, on which a specimen is placed; a charged particle beam optical system to irradiate a charged particle beam on the specimen; an etchant material supplying source to supply an etchant material, which contains fluorine and carbon in molecules thereof, does not contain ... 12/21/06 - 20060284111 - Device and method for electron beam irradiation The present invention refers to a device for electron beam irradiation of at least a first side of a web, the device comprising a tunnel through which the web is adapted to pass, said tunnel being provided with a web inlet portion, a web outlet portion and a central portion ... 11/30/06 - 20060266956 - Method of expanding mineral ores using microwave radiation Here is described a method of expanding mineral ore particles, preferably perlite, to effect rapid heating of particles to a required softening temperature so that the selected size and shape of expanded ore particles is obtained. A microwave radiation with appropriate frequency and power density is chosen so as to ... 11/30/06 - 20060266955 - Apparatus for curing a coating on a three-dimensional object An apparatus is provided for curing a curable coating on a three-dimensional object having at least a top surface and a side surface, with the object being advanced along a generally horizontal path. The apparatus includes an elongated light source of radiating curing energy for curing the coating on the ... 11/30/06 - 20060266954 - Specific macromolecule crystal evaluator A specific macromolecule crystal evaluating device according to the present invention is equipped with a sample detecting stage for detecting a protein crystal in a sample container, an X-ray measuring stage that is spaced from the sample detecting stage and carries out X-ray diffraction measurement of the protein crystal, a ... 11/23/06 - 20060261289 - Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method An optical image is formed in a radiation-sensitive layer (5), by a number of sub-illuminations, in each of which an array of light valves (21-25) and a corresponding array (40) of converging elements (43) are used to form a pattern of spots in the resist layer (5) in accordance with ... 11/23/06 - 20060261288 - Liquid removal in a method an device for irradiating spots on a layer For irradiating a layer (3) a radiation beam (7) is directed and focused to a spot (11) on the layer (3), relative movement of the layer (3) relative to the optical element (59) is caused so that, successively, different portions of the layer (3) are irradiated and an interspace (53) ... 11/16/06 - 20060255293 - Method for decreasing chemical diffusion in parylene and trapping at parylene-to-parylene interfaces Systems and methods for improving the adherence of poorly-adherent parylene-to-parylene films or layers and/or altering the water and chemical permeability of the parylene layers. A device having two or more parylene layers is heated in a reduced pressure treatment chamber at a temperature above the deposition temperature of the parylene ... 11/09/06 - 20060249694 - Marking of diamond A method of marking or coloring a diamond article, such as a surgical blade, wire die, diamond anvil, laser window, or the like, to generate a reference mark that may subsequently be modified, reduced or removed by an annealing technique. The method of coloring uses particles such as electrons, ions, ... 10/26/06 - 20060237668 - Dual hemispherical collectors A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation ... 10/26/06 - 20060237667 - Submicron particle removal A system for non-contact cleaning of particulate contamination of surfaces includes one or more sources that create a charge imbalance between a surface and particles that contaminate the surface, and a power supply that creates a pulsed electrical bias on the surface. This imbalance produces an electrostatic force that propels ... 10/19/06 - 20060231773 - Charged particle beam apparatus A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed ... 10/19/06 - 20060231772 - Charged particle beam device with cleaning unit and method of operation thereof The invention provides a charged particle beam device, an emitter module for emitting charged particle beams and a method of operation thereof. Thereby, a charged particle beam emitter (15) emitting charged particles along an optical axis (1) is realized. On the same carrier body (32), a cleaning emitter (16) for ... 10/05/06 - 20060219949 - Fib milling of copper over organic dielectrics Apparatus and processes are disclosed for milling copper adjacent to organic low-k dielectric on a substrate by directing a charged-particle beam at a portion of the copper and exposing the copper to a precursor sufficient to enhance removal of the copper relative to removal of the dielectric, wherein the precursor ... 10/05/06 - 20060219948 - Charged particle therapy apparatus and charged particle therapy system A charged particle therapy system is disclosed in which a hard switch for making a beam request of the accelerator side is installed in an irradiation room so that the accelerator side can start a desired beam irradiation preparation after depressing the hard switch. This arrangement allows the accelerator allocated ... 10/05/06 - 20060219947 - Dedicated metrology stage for lithography applications A system and method are used to detect parameters regarding an exposure portion or an exposure beam. The system comprising a substrate stage and a metrology stage. The substrate stage is configured to position a substrate to receive an exposure beam from an exposure portion of a lithography system. The ... 10/05/06 - 20060219946 - Electron beam apparatus and method for production of its specimen chamber A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a ... 10/05/06 - 20060219945 - Radiation therapy machine calibration apparatus providing multiple angle measurements A phantom for rotational radiation therapy machines allows beam fluence and energy to be measured at a variety of beam angles without intervening adjustment of the phantom. The phantom in the preferred embodiment provides two half cylinders directed along the axis of rotation of the machine abutting about a common ... 10/05/06 - 20060219944 - Multichannel ion gun The present invention discloses systems and methods for generating low energy, high current ion beams by scaling beamline dimensions and employing multiple beamlines. An array of beamlets is generated by an ion source. The beamlets then pass through a mass analysis module that permits selected ions to pass while blocking ... 09/28/06 - 20060214117 - Electron-beam exposure system and electron-beam exposure method A multicolumn electron-beam exposure system includes: a plurality of column cells, which are arranged above a wafer, and each of which includes an electron gun and deflection means which deflects an electron beam irradiated from the electron gun; common storage means which stores common exposure data used by the plurality ... 09/28/06 - 20060214116 - Charged beam exposure apparatus, charged beam exposure method, method of manufacturing mask, and method of manufacturing semiconductor device A exposure apparatus includes a charged beam radiating unit configured to radiate a charged beam, a shaping unit including an opening for shaping the beam, a storage unit to store a history of data concerning a beam area of the beam on the shaping unit, a predicting unit to predict ... 09/21/06 - 20060208201 - Apparatus and method for substrate neutralization and glass substrate charging prevention A neutralizing method and a neutralizing apparatus for effectively neutralizing an insulating member in a simple and efficient way are disclosed. A hard X-ray generating device radiates a hard X-ray on the obverse surface of the insulating member from the direction perpendicular to the obverse surface of the insulating member. ... 09/07/06 - 20060197036 - Lithographic apparatus and device manufacturing method A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; a gas pressure controlled article clamp for clamping an article to be placed in a beam path of the projection beam of radiation; and a pressure circuit for controlling the article clamp, comprising a supply line ... 08/31/06 - 20060192147 - Multilayer mirror, method for manufacturing the same, and exposure equipment A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and ... 08/31/06 - 20060192146 - Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target includes an RMW device. The RMW device comprises a housing and an ... 08/31/06 - 20060192145 - Charged particle beam apparatus and method for operating the same A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width ... 08/31/06 - 20060192144 - Electron beam welding method and apparatus An electron beam welding apparatus includes an electron beam generator for selectively emitting an electron beam into a weld chamber. The electron beam welding apparatus further includes a measuring device for detecting an intensity of the electron beam and a slit plate disposed between the electron beam generator and the ... 08/31/06 - 20060192143 - Charged particle beam lithography apparatus and method A charged particle beam lithography apparatus includes a charged particle beam generation source; a charged particle beam forming portion through which the charged particle beam is transmitted; a first deflector arranged between the charged particle beam forming portion and the charged particle beam generation source; a second deflector arranged between ... 08/31/06 - 20060192142 - Ion implanter, and angle measurement apparatus and beam divergence measurement apparatus for ion implanter An apparatus is provided which is capable of measuring an angle between a holder and an ion beam without generating particles, with a simple structure, in a short time and at high accuracy even during an implantation state. An angle measurement apparatus is configured to: measure an angle of the ... 08/31/06 - 20060192141 - Method and devices for producing corpuscular radiation systems The invention pertains to a process for the production of particle beam systems (10-10″″, 12-12″), in which at least one first particle beam system (10-10″″) is produced on a first substrate (14) by computer-guided particle beam-induced deposition, and the minimum of one first particle beam system (10-10″″) is used to ... 08/31/06 - 20060192140 - Process for electron sterilization of a container Minimum electron energy is used for the sterilization of preformed containers in order to minimize the machinery size, cost and radiation shielding required for in-line use. The electron energy required is reduced by the use of one-sided (unilateral) irradiation wherein the dose delivered by the primary radiation to thicker portions ... 08/31/06 - 20060192139 - Device for irradiating a target with a hadron-charged beam, use in hadrontherapy A device for irradiating a target by a charged hadron beam, which may find application in hadron therapy. The device includes corpuscular optics designed to make the density of the beam uniform, along at least one direction perpendicular to the trajectory of the beam, and a three-dimensional control for the ... 08/24/06 - 20060186352 - Measuring method, exposure apparatus, and device manufacturing method A measuring method that utilizes a bandpass filter and a measurement apparatus to measure an intensity of light having a predetermined wavelength among lights emitted from a light source, the bandpass filter transmitting the light having the predetermined wavelength, the measurement apparatus measuring an absolute intensity of an incident light ... 08/24/06 - 20060186351 - Inspection method and inspection apparatus using charged particle beam To establish a technique that enables sorting of the elevation and azimuth angle in the direction of emitting secondary electrons and obtaining images with emphasized contrast, in order to perform the review and analysis of shallow asperities and microscopic foreign particles in a wafer inspection during the manufacture of semiconductor ... 08/24/06 - 20060186350 - Installation and method for sterilising objects by low-energy electron bombardment The invention relates to an installation (1) for sterilising objects (2) by low-energy electron bombardment, including sterilisation means (18) capable of generating an electron beam along an axis (A) passing through a treatment chamber (16). According to the invention, the installation includes a mechanical module (12) designed so as to ... 08/10/06 - 20060175557 - Apparatus for projecting a reduced image of a photomask using a schwarzschild objective An optical system for projecting an image of a photomask on a substrate, using a Schwarzschild objective includes an excimer laser, beam shaping optics for shaping a laser beam from the laser and a beam-dividing prism. The beam-dividing prism has a dividing-face including four facets inclined at an angle to ... 08/10/06 - 20060175556 - Illumination optical system, exposure apparatus, and device manufacturing method An illumination optical system for illuminating a target plane by using light from a light source includes plural displaceable mirrors that are two-dimensionally arranged at specific positions in said illumination optical system. ... 07/13/06 - 20060151716 - Micro-column electron beam apparatus Provided is a micro-column electron beam apparatus including: a base; an electron lens bracket on which an electron lens modulate can be fixed, mounted in a central portion of the base; an electron beam source tip module vertically disposed on the electron lens module; a pan spring plate stage module ... 07/06/06 - 20060145093 - Method and device for electron beam irradiation The invention refers to a method and device for ventilating a device for electron beam irradiation of a web (W), the method comprising the steps of: providing a first chamber (107) comprising a web inlet opening (115) and a web outlet opening (121), providing a second chamber (111) extending inside ... 06/29/06 - 20060138348 - Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first ... 06/15/06 - 20060124865 - Energetic neutral particle lithographic apparatus and process An energetic neutral particle lithographic apparatus is disclosed for replicating sub-micron and nanoscale patterns including a source producing a beam of energetic neutral particles, comprising atoms or molecules, by charge transfer scattering of energetic ions from the molecules of a gas, a mask member having open stencil windows in a ... 05/18/06 - 20060102854 - Apparatus and method for polishing gemstones and the like The invention comprises a two-step process for achieving an ultra-polish finish on materials such as gemstones and the like by first performing a chemical-mechanical polishing of the material using an intermetallic material as the grinding medium followed by a gas cluster ion beam (GCIB) treatment. The intermetallic grinding wheel is ... 05/11/06 - 20060097189 - Disinfecting system for a toilet The present invention provides a disinfecting system that uses ultraviolet light to disinfect a toilet seat and toilet bowl. The disinfecting system is mounted to a toilet seat cover. A control is used to activate the system when the toilet seat cover is lowered. An indicator light can be mounted ... 05/04/06 - 20060091323 - Exposure apparatus and exposure method for performing high-speed and efficient direct exposure An exposure apparatus, in which exposure data necessary for direct exposure is sequentially supplied to an exposure engine having a plurality of exposure devices and, based on the thus supplied exposure data, the exposure engine forms an exposure pattern on an exposure target substrate moving relative to the exposure engine, ... 05/04/06 - 20060091322 - Scanning probe-based lithography method A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally ... 03/23/06 - 20060060793 - Laparoscopic tumor therapy using high energy electron irradiation A laparoscopic tumor therapy method and an articulated electron beam transport system are provided for use with a high power, long focus electron source for tumor therapy. The high power, long focus electron source generates an e-beam. The e-beam is transported through a laparoscopic tube proximate a target tumor for ... 02/16/06 - 20060033042 - Apparatus and method for compensation of movements of a target volume during ion beam irradiation The invention relates to an apparatus and method for compensation of three-dimensional movements of a target volume (1) during ion beam irradiation. For the purpose, the apparatus comprises a position location and tracking system (4) for detecting the movements and a depth modulator (6) for modifying the depth of penetration ... 02/09/06 - 20060027762 - Light irradiation apparatus, crystallization apparatus, crystallization method and device A light irradiation apparatus includes a light modulation element which has a phase step having a phase difference substantially different from 180°, an illumination optical system which illuminates the light modulation element, and an image formation optical system which forms, on an irradiation surface, a light intensity distribution based on ... 01/26/06 - 20060017014 - Patterned wafer inspection method and apparatus therefor An electron beam (area beam) having a fixed area is irradiated onto the surface of a semiconductor sample, and reflected electrons from the sample surface are imaged by the imaging lens, and images of a plurality of regions of the surface of the semiconductor sample are obtained and stored in ... 01/26/06 - 20060017013 - Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device A charged particle beam drawing equipment includes charged particle beam source, first and second shaping aperture masks with first and second opening portions for rotation adjustment, detection section to detect charged particle beam intensity distribution in a plane parallel to the second mask, the beam being emitted from the source ... 01/26/06 - 20060017012 - Ion implantation apparatus An ion source capable of generating only a monoatomic ion is used as an ion source, and a gas supplying section is provided between a first mass spectrograph and a second mass spectrograph. In order to irradiate a cluster molecule ion, a polyatomic molecule gas is introduced into the gas ... 01/26/06 - 20060017011 - Ion source with particular grid assembly An ion source (1) to be used in optical thin film deposition by IAD process includes a discharge chamber (10), a gas source, an actuator (11), a grid assembly (20) and an outer shell (30). The grid assembly includes a screen grid (21), an accelerator grid (22) and a decelerator ... 01/26/06 - 20060017010 - Magnet for scanning ion beams An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by ... 01/19/06 - 20060011863 - Electron beam method and apparatus for improved melt point temperatures and optical clarity of halogenated optical materials A controlled electron beam and heat will increase the melt point temperature and improve the optical clarity of a halogenated optical material. The electron beam and heat irradiation will occur in a chamber under near vacuum conditions. The electron beam imparts sufficient energy to the chemical bonds within the halogenated ... 12/22/05 - 20050279951 - Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing euv reflection of a grazing incidence mirror, device manufacturing method and device manufactured A grazing incidence mirror includes a mirror substrate and a mirror surface layer, the mirror surface layer including a first layer and a second layer, the first layer being positioned between the mirror substrate and the second layer. The first layer includes a material selected from the group of Mo, ... 12/01/05 - 20050263719 - Ultraviolet ray generator, ultraviolet ray irradiation processing apparatus, and semiconductor manufacturing system The present invention relates to an ultraviolet ray generator 101, and the generator 101 has an ultraviolet ray lamp 1, a protective tube 2 being made of a material which is transparent with respect to ultraviolet ray and housing the ultraviolet ray lamp 1, and gas introduction port 6a introducing ... 11/24/05 - 20050258378 - Method and apparatus for high speed activation of oxygen scavenging compositions The invention is a method, triggering unit, and system for activating an oxygen scavenging composition at high speeds. The triggering unit includes a plurality of UV lamps that can operate at increased temperatures and have high output intensites from about 10 to 35 mW/cm2. The triggering unit can activate films ... 10/27/05 - 20050236584 - Exposure method and apparatus An illumination optical system that includes an optical integrator for uniformly illuminating an object, and a light guide part for guiding a light to the optical integrator, wherein said light guide part includes a first mirror that has a first opening part, and a second mirror that has a second ... 10/27/05 - 20050236583 - Method and apparatus for determining thickness of a semiconductor substrate at the floor of a trench Apparatus and method for exposing a selected feature of an integrated circuit device such as a selected portion of the metallization layer, from the backside of the integrated circuit substrate without disturbing adjacent features of the device such as the active semiconductor regions. This is performed using a FIB (focused ... 09/29/05 - 20050211919 - System and method for patterning a flexible substrate in a lithography tool A system and method are used to feed a flexible substrate through a patterned beam to be exposed at target portions by the pattered beam. In one example, the flexible substrate is passed over a chuck (e.g., a vacuum chuck). In one example, the chuck can bias the flexible substrate ... 09/15/05 - 20050199827 - Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device A charged particle beam apparatus includes: a charged particle beam generator which generates a charged particle beam; a projection optical system which generates a lens field to focus the charged particle beam on an external substrate; and deflectors arranged so as to surround an optical axis of the charged particle ... 09/01/05 - 20050189498 - Irradiation apparatus An irradiation apparatus for a photodynamic treatment. The irradiation apparatus includes a main body, a high power light emitting element, an optical lens assembly and an optical fiber. The high power light emitting element is disposed on the main body to output light. The optical lens assembly is adjacent to ... 08/18/05 - 20050178979 - Light generator and exposure apparatus A light generator for irradiating a laser onto a target, for generating plasma, and for producing light from the plasma, includes a first optical system for introducing the light to the target, a second optical system for introducing the light, and a unit for irradiating the laser onto debris that ... 08/11/05 - 20050173654 - Apparatus and method for irradiating electron beam An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and ... 08/11/05 - 20050173653 - Exposure apparatus and method An exposure apparatus includes a projection optical element that includes at least one reflection element and projects light from a reticle that forms a pattern onto an object, and a drive part that moves at least one of the reticle and the reflection element. ... 08/04/05 - 20050167613 - Apparatus and process for irradiating product pallets The present invention is also related to a process wherein a product pallet is brought into an irradiation chamber (2) through a revolving cylindrical door (6) having a recess (8), and irradiated while in said recess (8) or in front of said recess (8). ... 06/23/05 - 20050133733 - Electron beam system and method of manufacturing devices using the system An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an ... 06/23/05 - 20050133732 - Stage unit, drive table, and scanning exposure apparatus using same An exposure method for manufacturing a liquid crystal display utilizes a scanning exposure apparatus to expose a pattern of a mask onto a glass plate. The exposure method includes a step of moving a mask stage that holds the mask in a scanning direction by a first electromagnetic actuator. The ... 06/16/05 - 20050127307 - Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus Methods and devices are disclosed for evaluating image performance in a charged-particle-beam (CPB) microlithography apparatus. In the disclosed method, multiple knife-edge reference marks are defined by a plate positioned at an image plane. The reference marks are illuminated by measurement beamlets formed by an upstream subfield. The beamlets are scanned ... 06/16/05 - 20050127306 - Particle beam irradiation system and method of adjusting irradiation field forming apparatus A particle therapy system, as one example of a particle beam irradiation system, comprises a charged particle beam generator and an irradiation field forming apparatus. An ion beam from the charged particle beam generator is irradiated to a diseased part in the body of a patient through the irradiation field ... 06/09/05 - 20050121623 - Electron beam duplication lithography method and apparatus An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic ... 06/02/05 - 20050116182 - Method of measuring pattern dimension and method of controlling semiconductor device process This invention provides a method of measuring semiconductor pattern dimensions capable of realizing a stable and highly precise pattern dimension measurement technique even when the pattern cross-sectional shapes are changed and making the calculation amount relatively small to reduce the calculation time. More specifically, the relationship between cross-sectional shapes of ... 06/02/05 - 20050116181 - Non-mechanical recording and retrieval apparatus A recording and retrieval device is disclosed. The recording and retrieval device generates an electron beam which selectively exposes portions of a film to thereby record digital data on the film. An input circuit adjusts a characteristic of the electron beam selectively expose portions of the film. An anode target ... 06/02/05 - 20050116180 - Charged-particle beam lithographic system When the focal point of the objective lens of a charged-particle beam lithographic system is shifted according to the deflection position within a writing field, the image magnification of the objective lens will vary. In the present invention, the focal point of the objective lens is shifted in a corresponding ... 06/02/05 - 20050116179 - Led modifying apparatus and method A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive ... 06/02/05 - 20050116178 - Led modifying apparatus and method A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive ... 06/02/05 - 20050116177 - Led modifying apparatus and method A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive ... 06/02/05 - 20050116176 - Led curing apparatus and method A radiation curing apparatus comprises a plurality of solid state radiation sources to generate radiation that cures a first material. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated ... ### FreshPatents.com Support - Terms & Conditions |